The AC Electrical Characterization of Au/Porous Silicon/p-Si Structures

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The AC electrical characterization of Au/porous silicon/p-Si structures is presented. The low porosity Porous Silicon layers were prepared by electrochemical etching in p-type silicon <100> with two resistivities. The AC electrical measurements capacitance – conductance – frequency were performed from 5Hz to 10MHz, at room temperature in the DC range of ± 2V. We studied two structures; first a conductor type Au/PS/Au and second diode type Au/PS/p-Si/Al.

Using silicon wafers p-Si as starting material and electrochemical anodizing process permit to obtained commonly a nanostructured semiconductor material [1,2]. The material produced is known as Porous silicon (PS) [3,4]. In order to investigate its electrical properties, two main porous silicon structures are formed by a p-Si wafer; the first structure is between two metal electrodes on top, usually aluminum [5,6] or gold [7,8]. Thus, the structure produced it’s a conductor type (metal/PS/metal). The second structure formed it’s a diode type (metal/PS/p-Si/metal), these structures are in type p crystalline silicon [2,9].

Measurement of AC electrical characterization is im-portant for dielectric characterization of materials. This characterization technique permits to separate the dielectric permittivity properties corresponding to the capacitances present in the relaxation region in the porous silicon layers [10,11]. The AC dielectric analysis is interpreted in terms of the admittance or impedance measurement and the equivalent electrical circuits are formed by RC networks in parallel [12,13], connected in series with an inductance [7,14] or capacitance [9,10].

In relation to the electrical properties of PS structures under forward and reverse bias conditions two main trends ...

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...vances in Electroce-ramic Materials, edited by K.M. Nair, D. Suvorov, R.W. Schwarts, R. Guo, Ceramic Transactions Series, Vol. 204 (Wiley, New Jersey, 2009). p. 113.

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[13] A.K. Jonscher, Dielectric Relaxation in Solids (Chelsea Di-electrics Press, London, 1983).

[14] C.A. Betty, R. Lal, and J.V. Yakhmi, Electrochim. Acta 54, 3781 (2009).

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[16] E. Bhattacharya, P. Ramesh, and C. Suresh Kumar, J. Po-rous Mater. 7, 299 (2000).

[17] M.A. Chavarria and F. Fonthal, in Proceedings 6th Int. Conf. CERMA 2009, Cuernavaca, Mexico, (IEEE Compu-ter Society, Los Alamitos, 2009). pp. 287-292.

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